PILOT 3D‘s compentences ranges from simulation and design to fabrication. Our manufacturing process is embedded in a clean room environment. We have access to technologies ranging from electron beam lithography to micromolding and advanced analytical tools such as SEM (electron microscopy) and AFM (atomic force microscopy). In addition we can supply a variety of optical characterization tools.
PILOT-3D's technology for fabrication of three-dimensional micro- and nanostructures in photo-sensitive materials is based on two-photon lithography. This technique exploits two-photon absorption to induce polymerization of negative-tone photoresists or to break chemical bonds in the case of positive-tone processes. Two-photon polymerization can be used with a large variety of standard UV-curable resists. A necessary condition for this effect is a sufficiently high light intensity that is provided by ultrashort laser pulses. The laser beam is focused into the resist and the polymerization is triggered only in the focal point volume. By moving the focal point through the volume, almost arbitrary 3D objects can be built up.
This technology both allows for additive manufacturing as well as maskless lithography on the sub‑µm scale up to the mm-scale in one device.